Technical data
![LOI_R-BAF_Silicon-Steel-Strip LOI_R-BAF_Silicon-Steel-Strip](/sites/default/files/images/solutions/headers/LOI_R-BAF_Silicon-Steel-Strip.jpg)
Capacity 80,000 – 100,000 t/a
Annealing temperature 1,200 °C
Diameter approx. 80 m
Process gas 100% N2; HNx; 100 % H2
Capacity 80,000 – 100,000 t/a
Annealing temperature 1,200 °C
Diameter approx. 80 m
Process gas 100% N2; HNx; 100 % H2